Búsqueda de LIBROS DEL AUTOR: kim c u

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  • ELECTROMIGRATION IN THIN FILMS AND ELECTRONIC DEVICES: MATERIALS AND RELIABILITY
    KIM, C-U
    Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area.Part one consists of three introductory chapters, covering modelling of electromigration...

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